Vibrational spectroscopy and core-level photoelectron spectroscopy are two
of the most powerful tools for surface chemical analysis. We have used both
techniques in conjunction with others to study hydrocarbon radical interac
tions with metal and semiconductor surfaces as well as thin film deposition
processes. These include the investigations of CH2 and CH3 reactions on Cu
by high resolution electron energy loss spectroscopy (HREELS), and GaN for
mation from Ga(CH3)(3) and NH3 on SiC by SR-PES. The vibrational analysis h
as revealed rich surface chemistry of the radicals while the photoemission
study has led us to develop new approach for probing ultrafine structures.
The effort involves the construction of a scanning photoemission spectromic
roscope (SPEM) coupled to a synchrotron radiation light source. Recent resu
lts are presented in this brief report. (C) 2001 Elsevier Science B.V. All
rights reserved.