Surface chemistry: from vibrational spectroscopy to photoemission spectromicroscopy

Citation
Tj. Chuang et al., Surface chemistry: from vibrational spectroscopy to photoemission spectromicroscopy, APPL SURF S, 169, 2001, pp. 1-10
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
169
Year of publication
2001
Pages
1 - 10
Database
ISI
SICI code
0169-4332(20010115)169:<1:SCFVST>2.0.ZU;2-N
Abstract
Vibrational spectroscopy and core-level photoelectron spectroscopy are two of the most powerful tools for surface chemical analysis. We have used both techniques in conjunction with others to study hydrocarbon radical interac tions with metal and semiconductor surfaces as well as thin film deposition processes. These include the investigations of CH2 and CH3 reactions on Cu by high resolution electron energy loss spectroscopy (HREELS), and GaN for mation from Ga(CH3)(3) and NH3 on SiC by SR-PES. The vibrational analysis h as revealed rich surface chemistry of the radicals while the photoemission study has led us to develop new approach for probing ultrafine structures. The effort involves the construction of a scanning photoemission spectromic roscope (SPEM) coupled to a synchrotron radiation light source. Recent resu lts are presented in this brief report. (C) 2001 Elsevier Science B.V. All rights reserved.