Initial oxidation process of Mg films characterized by AES, EELS, and UPS

Authors
Nishita, K Saiki, K Koma, A
Citation
K. Nishita et al., Initial oxidation process of Mg films characterized by AES, EELS, and UPS, APPL SURF S, 169, 2001, pp. 180-183
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
169
Year of publication
2001
Pages
180 - 183
Database
ISI
SICI code
0169-4332(20010115)169:<180:IOPOMF>2.0.ZU;2-W
Abstract
Initial oxidation process of Mg films was investigated by Anger electron sp ectroscopy (AES), electron energy loss spectroscopy (EELS) and ultraviolet photoelectron spectroscopy (UPS). A polycrystalline Mg film was exposed to oxygen at room temperature. An inspection of EELS reveals that the initial oxidation process could be classified according to the curve profile in the low energy loss region. The oxide formation is initiated after oxygen expo sure of 3 L (Langmuir). (C) 2001 Elsevier Science B.V. All rights reserved.