The growth of Ag films on a TiO2(110)-(1 x 1) surface

Citation
C. Su et al., The growth of Ag films on a TiO2(110)-(1 x 1) surface, APPL SURF S, 169, 2001, pp. 366-370
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
169
Year of publication
2001
Pages
366 - 370
Database
ISI
SICI code
0169-4332(20010115)169:<366:TGOAFO>2.0.ZU;2-T
Abstract
We report here the growth of Ag film and its thermal stability on the TiO2( 110)-(1 x 1) surface using combination techniques of low-energy ion scatter ing (LEIS), X-ray photoelectron spectroscopy (XPS), and low-energy electron diffraction (LEED). At a surface temperature as low as 125 K, a 2D growth of Ag films seems to occur for submonolayer coverages up to similar to0.8 M L. Annealing of low temperature grown Ag films to 500 K for coverage of 1-2 .4 Mt would result in the formation of metastable Ag layers with rest of Ag forming 3D needle-Like islands on top of this Ag film. (C) 2001 Elsevier S cience B.V. All rights reserved.