Surface electromigration of Au ultrathin film on MoS2

Authors
Wu, NJ Shimizu, S Hermie, MT Sakamoto, K Natori, A Yasunaga, H
Citation
Nj. Wu et al., Surface electromigration of Au ultrathin film on MoS2, APPL SURF S, 169, 2001, pp. 485-488
Citations number
5
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
169
Year of publication
2001
Pages
485 - 488
Database
ISI
SICI code
0169-4332(20010115)169:<485:SEOAUF>2.0.ZU;2-5
Abstract
The mass transport of Au ultrathin film on a semiconductor MoS2 was investi gated by atomic force microscopy (AFM) and scanning Auger microscopy (SAM). The surface electromigration of the Au film was found when a de current wa s passed through the MoS2 substrate. The Au ultrathin film on MoS2 grew in a typical Volmer-Weber (V-W) growth mode, The AFM measurements indicated th at the distribution of the Au islands exhibited clearly a preferential late ral spread towards the cathode, that is, the surface electromigration took place. The direction of the surface electromigration on MoS2 is opposite to that of the Au electromigration on Si. (C) 2001 Elsevier Science B.V. All rights reserved.