K. Kiyokawa et al., Microwave-induced non-equilibrium plasmas by insertion of substrate at lowand atmospheric pressures, APPL SURF S, 169, 2001, pp. 599-602
We found that microwave induced discharge or microwave plasma could be easi
ly produced with a perovskite-type oxide substrate even at atmospheric pres
sure. We investigated the plasma conditions in order to understand the plas
ma generation mechanism. When pressure in the reactor was gradually increas
ed, the plasma mode was changed from a diffused glow to a filamentary glow
at a power of about 5.3 x 10(4) Pa. The electron density of the plasma prod
uced using a substrate was higher than that of the ordinary microwave plasm
a produced without the substrate. It was considered that the electron emiss
ions from the substrate enhanced the plasma. (C) 2001 Elsevier Science B.V.
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