Studying layer uniformity of sputter coatings by intensity distribution ofplasma spectrum

This study conducted a simulation work on the layer uniformity of sputter c oatings in a vacuum chamber based on deconvolution of measuring plasma emis sion spectra, and compared to the corresponding measurements of film thickn ess distribution. The simulative method started from an Ar-normalized Sr in tensity distribution derived from deconvoluting the plasma spectra by using Abel inversion method, which was considered as the spatial distribution of the sputtering rate of the source target. The thickness profile on the sub strate was then calculated based on the source with nth power of cosine law assumption. It was observed that the exponent of cosine law approached zer o due to collisions of species. Good agreement between simulation and exper imental observation revealed that the simulation method based on spectrosco pic measurement could be used as an in situ estimation of the deposition un iformity of similar systems. (C) 2001 Elsevier Science B.V. All rights rese rved.