GROWTH OF FERROELECTRIC (K0.5NA0.5)(0.2)(SR0.75BA0.25)(0.9)NB2O6 THIN-FILMS BY PULSED-LASER DEPOSITION

Citation
My. Li et al., GROWTH OF FERROELECTRIC (K0.5NA0.5)(0.2)(SR0.75BA0.25)(0.9)NB2O6 THIN-FILMS BY PULSED-LASER DEPOSITION, Solid state communications, 103(5), 1997, pp. 285-289
Citations number
16
Categorie Soggetti
Physics, Condensed Matter
Journal title
ISSN journal
00381098
Volume
103
Issue
5
Year of publication
1997
Pages
285 - 289
Database
ISI
SICI code
0038-1098(1997)103:5<285:GOF(T>2.0.ZU;2-A
Abstract
Growth of (K0.5Na0.5) (0.2)(Sr0.75Ba0.25)(0.9)Nb2O6(KNSBN) films on (0 01) MgO substrates and on (001) oriented La0.5Sr0.5CoO3(LSCO) layers b y pulsed laser deposition has been studied. X-ray diffraction theta-2 theta scans indicated that the KNSBN films were of c-axis orientation. X-ray Phi scans on the (221) reflection revealed that the films grown on the MgO substrates were epitaxial growth with two [100]KNSBN in-pl ane orientation rotating about +/-18 degrees with respect to [100]MgO. Sandwich structures of KNSBN films with LSCO as top and bottom electr odes have been performed on (001)LaAlO3(LAO) substrates. The measureme nts of the ferroelectricity of the as-grown film gave hysterisis loop with the remnant polarization of P-r similar to 8 mu C cm(-2) and the coercive field of E-c similar to 55 KV cm(-1). (C) 1997 Elsevier Scien ce Ltd.