Anomalous turn-on voltage degradation during hot-carrier stress in polycrystalline silicon thin-film transistors

Citation
Fv. Farmakis et al., Anomalous turn-on voltage degradation during hot-carrier stress in polycrystalline silicon thin-film transistors, IEEE ELEC D, 22(2), 2001, pp. 74-76
Citations number
12
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE ELECTRON DEVICE LETTERS
ISSN journal
07413106 → ACNP
Volume
22
Issue
2
Year of publication
2001
Pages
74 - 76
Database
ISI
SICI code
0741-3106(200102)22:2<74:ATVDDH>2.0.ZU;2-#
Abstract
In this letter, we present experimental data showing that hot-carrier stres s in laser annealed polycrystalline silicon thin-film transistors provokes an anomalous turn-on voltage variation, Although under various hot-carrier stress intensities the maximum transconductance degradation shows the same power-time dependent law, turn-on voltage can exhibit different behaviors. This observation lead to the conclusion that turn-on voltage depends on two different degradation mechanisms: injection of hot carriers into the gate oxide and degradation of grain boundaries. We show that these two mechanism s may be distinguished since they obey different power-time dependent laws as a function of stress duration.