High-performance CMOS circuits fabricated by excimer-laser-annealed poly-Si TFTs on glass substrates

Citation
Y. Mishima et al., High-performance CMOS circuits fabricated by excimer-laser-annealed poly-Si TFTs on glass substrates, IEEE ELEC D, 22(2), 2001, pp. 89-91
Citations number
6
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE ELECTRON DEVICE LETTERS
ISSN journal
07413106 → ACNP
Volume
22
Issue
2
Year of publication
2001
Pages
89 - 91
Database
ISI
SICI code
0741-3106(200102)22:2<89:HCCFBE>2.0.ZU;2-M
Abstract
High-performance CMOS circuits are fabricated from escimer-laser-annealed p oly-Si TFTs on a glass substrate (300 X 300 mill). The propagation delay ti me of the 121-stage CMOS ring oscillators with 0.5 mum gate length is 0.18 nsec at 5 V supply voltage. The maximum operating frequency of the 40-stage shift registers with 1 mum gate length is 133 MH2 at 5 V supply voltage. T his value is high enough for peripheral CMOS circuits with line-at-a-time a ddressing.