Y. Mishima et al., High-performance CMOS circuits fabricated by excimer-laser-annealed poly-Si TFTs on glass substrates, IEEE ELEC D, 22(2), 2001, pp. 89-91
High-performance CMOS circuits are fabricated from escimer-laser-annealed p
oly-Si TFTs on a glass substrate (300 X 300 mill). The propagation delay ti
me of the 121-stage CMOS ring oscillators with 0.5 mum gate length is 0.18
nsec at 5 V supply voltage. The maximum operating frequency of the 40-stage
shift registers with 1 mum gate length is 133 MH2 at 5 V supply voltage. T
his value is high enough for peripheral CMOS circuits with line-at-a-time a
ddressing.