Physical origin of the excess thermal noise in short channel MOSFETs

Citation
Js. Goo et al., Physical origin of the excess thermal noise in short channel MOSFETs, IEEE ELEC D, 22(2), 2001, pp. 101-103
Citations number
15
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE ELECTRON DEVICE LETTERS
ISSN journal
07413106 → ACNP
Volume
22
Issue
2
Year of publication
2001
Pages
101 - 103
Database
ISI
SICI code
0741-3106(200102)22:2<101:POOTET>2.0.ZU;2-M
Abstract
The physical origin of the excess thermal noise in short channel MOSFETs is explained based on numerical noise simulation. The impedance field represe ntation and extraction method demonstrate that the drain current noise is d ominated by source side contributions. Analysis identifies local sc channel resistance variations as the primary controlling factor. The nonlocal natu re of velocity results in a smaller derivative of the velocity with respect to the field which in turn causes a higher local ac resistance near the so urce junction.