Laser probing of bipolar amplification in 0.25-mu m MOS/SOI transistors

Citation
O. Musseau et al., Laser probing of bipolar amplification in 0.25-mu m MOS/SOI transistors, IEEE NUCL S, 47(6), 2000, pp. 2196-2203
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Nuclear Emgineering
Journal title
IEEE TRANSACTIONS ON NUCLEAR SCIENCE
ISSN journal
00189499 → ACNP
Volume
47
Issue
6
Year of publication
2000
Part
3
Pages
2196 - 2203
Database
ISI
SICI code
0018-9499(200012)47:6<2196:LPOBAI>2.0.ZU;2-H
Abstract
The parasitic bipolar amplification in MOS/SOI transistors determines the S EU sensitivity of actual devices. This response is experimentally measured in a set of single transistors using a focused picosecond laser with submic rometer spatial resolution. This technique, validated by comparing the SEU behavior of registers irradiated with both laser and heavy ions, is relevan t for both device physics and hardness assurance applications.