Simulation of SEE-induced charge collection in UHV/CVD SiGeHBTs

Citation
Gf. Niu et al., Simulation of SEE-induced charge collection in UHV/CVD SiGeHBTs, IEEE NUCL S, 47(6), 2000, pp. 2682-2689
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Nuclear Emgineering
Journal title
IEEE TRANSACTIONS ON NUCLEAR SCIENCE
ISSN journal
00189499 → ACNP
Volume
47
Issue
6
Year of publication
2000
Part
3
Pages
2682 - 2689
Database
ISI
SICI code
0018-9499(200012)47:6<2682:SOSCCI>2.0.ZU;2-6
Abstract
This paper presents quasi-3-D simulation results of SEE-induced charge coll ection in UHV/CVD SiGe HBTs. Depending on the bias and load condition, a si gnificant fraction of electrons can be collected by the emitter rather than the collector. Most of the generated holes are collected by the substrate for deep ion strikes, and by the base for shallow ion strikes. A higher sub strate doping can worsen the upset of the circuit function, despite the red uced total amount of charge collected. A lower substrate doping and a lower collector-substrate junction reverse bias are desired to improve SEU hardn ess.