Modeling and measurement of monomer pressure evolution in an inductively coupled pulsed plasma reactor for thin polymer films

Citation
Lv. Shepsis et al., Modeling and measurement of monomer pressure evolution in an inductively coupled pulsed plasma reactor for thin polymer films, IEEE PLAS S, 28(6), 2000, pp. 2172-2178
Citations number
18
Categorie Soggetti
Physics
Journal title
IEEE TRANSACTIONS ON PLASMA SCIENCE
ISSN journal
00933813 → ACNP
Volume
28
Issue
6
Year of publication
2000
Pages
2172 - 2178
Database
ISI
SICI code
0093-3813(200012)28:6<2172:MAMOMP>2.0.ZU;2-1
Abstract
A model has been developed to predict the evolution of monomer pressure ove r time in an inductively coupled plasma reactor. The model uses an analogou s electrical circuit to predict preplasma gas flow conditions. Based on the monomer pressure model, a relationship between pressure prior to electrica l discharge and the corresponding plasma polymerized acetylene deposition r ate mas measured experimentally, A plot of measured deposition rate versus preplasma monomer pressure was observed to have a relative maximum.