Lv. Shepsis et al., Modeling and measurement of monomer pressure evolution in an inductively coupled pulsed plasma reactor for thin polymer films, IEEE PLAS S, 28(6), 2000, pp. 2172-2178
A model has been developed to predict the evolution of monomer pressure ove
r time in an inductively coupled plasma reactor. The model uses an analogou
s electrical circuit to predict preplasma gas flow conditions. Based on the
monomer pressure model, a relationship between pressure prior to electrica
l discharge and the corresponding plasma polymerized acetylene deposition r
ate mas measured experimentally, A plot of measured deposition rate versus
preplasma monomer pressure was observed to have a relative maximum.