Pulsed power for a rep-rate, electron beam pumped KrF laser

Citation
Jd. Sethian et al., Pulsed power for a rep-rate, electron beam pumped KrF laser, IEEE PLAS S, 28(5), 2000, pp. 1333-1337
Citations number
7
Categorie Soggetti
Physics
Journal title
IEEE TRANSACTIONS ON PLASMA SCIENCE
ISSN journal
00933813 → ACNP
Volume
28
Issue
5
Year of publication
2000
Pages
1333 - 1337
Database
ISI
SICI code
0093-3813(200010)28:5<1333:PPFARE>2.0.ZU;2-A
Abstract
A new type of pulsed power system has been designed and built for a rep-rat e, electron beam, pumped KrF laser. The system consists of two independent 11.2-kJ generators, which operate continuously at 5 Hz and will produce two opposing 500-kV, 110-kA, 100-ns flat-top electron beams. The system combin es the spark gap prime switch/step-up transformer design from the AIRIX and DAHRT injectors, and the water pulse-forming lines/output switch/vacuum in sulator design from the Nike 60-cm amplifier. The system is fully operation al, with both sides operating together. One side has operated continuously at 5 Hz for 90 000 shots, This paper describes the system and the results o f initial tests, including electrode wear.