A hard-tube pulser of 60 kV, 10 a for experiment and modeling in plasma immersion ion implantation

This paper describes an experiment and modeling in plasma immersion ion imp lantation using a high-voltage pulsed power system. This consists of a high -voltage pulse generator that uses a hard tube switch. The reason for using this type of circuit category in the Plasma Immersion Ion Implantation (PI II) facility rattler than a previously used pulse-forming network (PFN) cir cuit configuration is stated. The experimental results of the application o f this device to a glow discharge PIII are also discussed. In order to asse ss these results, a simple electrical model describes the plasma as a resis tive load in parallel with a capacitance taking into account the pulse rise -time distortion caused bg a long connecting coaxial cable. Plasma paramete rs for Pm processing, such as ion average implantation current and plasma s heath thickness, are calculated from the experimental settings.