Xb. Tian et Pk. Chu, Experimental investigation of the electrical characteristics and initiation dynamics of pulsed high-voltage glow discharge, J PHYS D, 34(3), 2001, pp. 354-359
Pulsed high-voltage glow discharge, a process that falls between convention
al plasma ion implantation and plasma nitriding, is a potentially effective
surface treatment technique. The electrical characteristics and initiation
dynamics of the process are experimentally investigated in this work. The
discharge behaviour is found to depend on the applied voltage, gas pressure
, pulse duration, and pulsing frequency. The voltage-current characteristic
s basically obey the collisionless Child-Langmuir relationship, and the dis
charge current varies substantially with the applied voltage and gas pressu
re in the high-voltage, high-pressure domain. The seed plasma before each g
low discharge pulse affects the initiation mechanism regardless of whether
it is sustained by an external plasma source or it is simply the residual p
lasma of the afterglow after the voltage pulse has been turned off. Our res
ults also disclose that the presence of an initial plasma before the glow d
ischarge is ignited has a large impact on the initiation time of the glow d
ischarge but has only a slight effect on the steady-state current.