Difference in the dynamic scaling behavior of droplet size distribution for coalescence under pulsed and continuous vapor delivery

Dynamic scaling behavior of the droplet size distribution in the coalescenc e regime fur growth by pulsed laser deposition is studied experimentally an d by computer simulation, and the same is compared With that fur continuous vapor deposition The scaling exponent for pulsed deposition is found to be (1.2 +/- 0.1), which is significantly lower as compared to that fur contin uous deposition (1.6 +/- 0.1). Simulations reveal that this dramatic differ ence can be traced to the large fraction of multiple droplet coalescence un der pulsed vapor delivery. A possible role of the differing diffusion field s in the two cases is also suggested.