The range of deposition temperatures for Ag-Cu system, in which the oriente
d phase layering takes place, has been experimentally determined. The mecha
nism of this process has been analyzed. During the simultaneous deposition
the well-oriented film structures with practically parallel mutual orientat
ion of crystal lattices of Cu and Ag phases of high dispersity, alternating
across the film thickness, have been obtained.
At room temperature the two-phase nanocrystal heterosystem with lateral gra
in size of 10-20 nm has been formed. The closeness in the parameters of cry
stal lattices is mainly caused by the decrease of a(Ag) down to the values
of 0.402-0.405 nm in the substrate temperature range up to 570 K, which cor
responds to the solubility of Cu in Ag nanocrystals as much as 17%. When th
e substrate temperature increases in a relatively narrow temperature range
near 520 K, the oriented crystallization with parallel conjugation of the s
ubstrate and the lattices of Ag: and Cu takes place with the grain structur
e dispersity preserved. The well defined double diffraction on the grains o
f both nanocrystal phases and the homogeneous concentration of components f
or the whole film thickness support the relative position of the phases as
the alternating lamellae. Thus, during the film growth the layering of the
phases was found to occur preferably in the growth direction. The compositi
on automodulation in the growth direction leads to the formation of irregul
ar layered compositions consisting of very fine mutually oriented lamellae
of both phases as large as several nanometers in diameter.