The sputtering rates of iron films and various steels exposed to argon-hydr
ogen pulsed-DC glow discharges in a commercial plasma-assisted chemical vap
our deposition plant have been studied experimentally. The sputtering rate
of iron was obtained from measurements of the film thickness before and aft
er glow-discharge exposure, using Rutherford backscattering spectrometry, a
nd the sputtering rates of the steels were obtained from shifts of position
s of implanted Xe markers in Rutherford backscattering spectra. Through ano
de-catcher experiments, the dependence of the sputtering rate on the oxygen
partial pressure was measured. To investigate any influence of the backgro
und oxygen pressure on the plasma (the cathode ion bombardment), energy spe
ctra of the ions hitting the cathode were also recorded. With finite oxygen
background pressures, iron sputtering rates much smaller than the ones cor
responding to sputtering yields of iron oxides were measured. In fact, due
to these low rates, it was only possible to establish upper limits to the i
ron and steel sputtering rates in glow discharges in the commercial chamber
. (C) 2001 Elsevier Science B.V. All rights reserved.