REACTOR MODELING OF MAGNETICALLY ENHANCED CAPACITIVE RF DISCHARGE

Magnetic and collisional effects on capacitive radio frequency (RF) di scharges for magnetically enhanced reactive ion etching (RF) are inves tigated, Using simplified plasma and sheath models, a collisional magn etic-sheath equation that governs the sheath dynamics under a de magne tic field crossed with a sinusoidal RF electric field is obtained, The sheath equation includes global effects of the bulk plasma. Together with the power-balance equation and the particle-conservation equation , the sheath equation is used to extract a circuit model and predict t he electrical behavior of MERIE reactors, Numerical results on the pla sma density and the power in MERIE reactors agree well with reported e xperimental results and the circuit model describes the reported disch arge properties well.