CHARACTERISTIC STRUCTURAL FEATURES OF AMORPHOUS HYDRATED SILICON FILMS DEPOSITED BY DIRECT-CURRENT DECOMPOSITION OF SILANE IN A MAGNETIC-FIELD

Authors
GOLIKOVA OA KUZNETSOV AN KUDOYAROVA VK KAZANIN MM
Citation
Oa. Golikova et al., CHARACTERISTIC STRUCTURAL FEATURES OF AMORPHOUS HYDRATED SILICON FILMS DEPOSITED BY DIRECT-CURRENT DECOMPOSITION OF SILANE IN A MAGNETIC-FIELD, Semiconductors, 31(7), 1997, pp. 691-694
Citations number
12
Categorie Soggetti
Physics, Condensed Matter
Journal title
Semiconductors → ACNP
ISSN journal
10637826
Volume
31
Issue
7
Year of publication
1997
Pages
691 - 694
Database
ISI
SICI code
1063-7826(1997)31:7<691:CSFOAH>2.0.ZU;2-P
Abstract
Data on the hydrogen content and different forms of hydrogen bonds wit h silicon in a-Si:H films deposited by direct-current decomposition of silane in a magnetic field (MASD) as a function of the deposition con ditions are presented: temperature, pressure of the mixture 25%SiH4 75%Ar, pumping rate, and insertion of a grid into the discharge chambe r. The correlations between the photoconductivity and the structural f eatures of the films are established. (C) 1997 American Institute of P hysics.