The photoluminescence of erbium ions in phosphorus-doped a-Si:H films
has been investigated. The observed increase in the Er photoluminescen
ce with increasing defect density in the samples and the correlation o
f the temperature variation of the Er photoluminescence and defect-ass
ociated photoluminescence intensities are explained on the basis of a
model of excitation of Er ions as a result of Auger recombination with
defect participation. (C) 1997 American Institute of Physics.