A novel single-component negative resist for DUV and electron beam lithography

Authors
Wu, HP Gonsalves, KE
Citation
Hp. Wu et Ke. Gonsalves, A novel single-component negative resist for DUV and electron beam lithography, ADVAN MATER, 13(3), 2001, pp. 195-197
Citations number
7
Categorie Soggetti
Multidisciplinary,"Material Science & Engineering
Journal title
ADVANCED MATERIALS
ISSN journal
09359648 → ACNP
Volume
13
Issue
3
Year of publication
2001
Pages
195 - 197
Database
ISI
SICI code
0935-9648(20010205)13:3<195:ANSNRF>2.0.ZU;2-L