Effect of photoelectrochemical oxidation on properties of GaN epilayers grown by molecular beam epitaxy

Citation
Dj. Fu et al., Effect of photoelectrochemical oxidation on properties of GaN epilayers grown by molecular beam epitaxy, APPL PHYS L, 78(9), 2001, pp. 1309-1311
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
9
Year of publication
2001
Pages
1309 - 1311
Database
ISI
SICI code
0003-6951(20010226)78:9<1309:EOPOOP>2.0.ZU;2-D
Abstract
GaN epilayers grown by molecular beam epitaxy were photoelectrochemically ( PEC) oxidized in an aqueous KOH solution. The oxidation effect was investig ated by defect-related photoconductivity and photoluminescence. The PEC tre ated GaN show decreased extrinsic photoresponse and concentration of deep l evel states in comparison with the as-grown sample. The PEC process also re sults in enhanced donor-bound exciton photoluminescence at 3.47 eV and rest rained 3.4 eV band. No strain is detected in the PEC oxidized GaN. The 3.4 eV band is related to structural defects instead of oxygen impurities. Rath er, the defects can be passivated by the PEC oxidation. (C) 2001 American I nstitute of Physics.