Synopsis of volume 43 - "Fundamentals of Plasma Chemistry" in the series "Advances in Atomic, Molecular, and Optical Physics"

A new volume in the series "Advances in Atomic, Molecular, and Optical Phys ics" devoted to "Fundamentals of Plasma Chemistry" (volume 43 edited by Mit io Inokuti and Kurl H. Becker) will be published shortly. Experts in electr on collisions, ion-molecule collisions, optical spectroscopy, electron kine tics, plasma modeling, plasma-surface interactions, and discharge and plasm a physics describe in 12 contributed articles the impact of selected areas of atomic, molecular and optical (AMO) physics on the recent advancement of plasma-based processes such as plasma etching, plasma-assisted deposition, and surface modification processes using non-thermal, non-equilibrium disc harge plasmas. Authors were encouraged to highlight how advances in basic A MO science contributed to an improved understanding of the complex processe s in low-temperature plasmas on a microscopic level or served as the basis for more sophisticated and more quantitative plasma diagnostics techniques. The various articles provide many examples of how challenges faced by the plasma processing community stimulated new research direction and advances in AMO science. The volume concludes with a chapter outlining future opport unities and challenges for AMO science in plasma chemistry applications.