Nanostructure formation on amorphous WO3 thin films in air by scanning tunneling microscopy

Citation
H. Qiu et al., Nanostructure formation on amorphous WO3 thin films in air by scanning tunneling microscopy, JPN J A P 1, 40(1), 2001, pp. 290-294
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
40
Issue
1
Year of publication
2001
Pages
290 - 294
Database
ISI
SICI code
Abstract
Scanning tunnelling microscope (STM) modifications on alpha -WO3-x thin fil ms were carried out in air. Holes and bumps were produced. Two mechanisms w ere clarified with respect to the water layer attached mon or less in modif ications. By applying voltage pulses, the high humidity (>60%) raised the p robability of hole formations. Connection lines were formed between the hol es, confirming a dominant electrochemical nature. The low humidity (<20%) r aised the probability of bump formations. Similar heights in both STM and a tomic force microscopy (AFM) images imply a physical transformation in the process. Depressed sides near the bumps strongly manifested the diffusion o f surface molecules: to the tip induced by the electric field gradient. In the intermediate humidity (20-60%), there was a higher voltage threshold fo r bump formations than for. hole formations, as well as for positive voltag e pulses than for negative voltage pulses. The discrepancies were reasonabl y attributed to the different tip-sample distances and the consequently ind uced electric fields.