Current density enhancement at active layer edges in polycrystalline silicon thin-film transistors

Citation
M. Kimura et al., Current density enhancement at active layer edges in polycrystalline silicon thin-film transistors, JPN J A P 2, 40(1AB), 2001, pp. L26-L28
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
40
Issue
1AB
Year of publication
2001
Pages
L26 - L28
Database
ISI
SICI code
Abstract
In polycrystalline silicon thin-film transistors, the electric field is con centrated- the carrier density is increased, and the current density is enh anced at active laver edges. This phenomenon is confirmed using the two-dim ensional (2-D) device simulation. Because of this phenomenon, the on-curren t is not proportional to the gate width. This dependence of the on-current on the gate width is confirmed using the 2-D device simulation and experime nt.