Texture transformations in reactive metal films deposited upon amorphous substrates

We present results that demonstrate how interfacial reactions between a met al film and substrate during deposition affect microstructural evolution. I n particular, we investigate Ti films deposited on amorphous SiO2 using ult rahigh vacuum transmission electron microscopy. Ti films were deposited in situ at room temperature and were examined using Auger electron spectroscop y and transmission electron microscopy. An initial [hk0] preferred orientat ion developed in films up to 2.5 nm in thickness. Films between 2.5 and 5.0 nm developed a [001] preferred orientation that persisted in films up to 2 0.0 nm thick. These data, in conjunction with Auger electron spectra and da rk-field microscopy, suggest that growth of Ti films on SiO2 is directly af fected by reactions at the Ti/SiO2 interface and that this reaction is resp onsible for the observed change in preferred orientation. (C) 2001 American Institute of Physics.