The control of organic outgassing from cleanroom construction materials is
becoming stricter as semiconductor device geometries continue to shrink. In
this article, a dynamic headspace sampling technique coupled with gas chro
matography-mass spectrometry (GC-MS) was studied for evaluating cleanroom c
onstruction materials. With this method, the outgassing amount increases li
nearly with increasing sampling time. The outgassing rate is determined fro
m the slope of this curve. The logarithm of the outgassing rate shows a lin
ens relation with a reciprocal number of the absolute temperature of outgas
sing. By using this relationship,the outgassing rate of materials at temper
atures of interest can be estimated from the available data.