E. Redondo et al., Influence of electron cyclotron resonance nitrogen plasma exposure on the electrical characteristics of SiNx : H/InP structures, J VAC SCI B, 19(1), 2001, pp. 186-191
We have studied the influence of nitrogen plasma exposure of the InP surfac
e on the electrical characteristics of electron cyclotron resonance deposit
ed Al/SiNx:H/InP devices. Nitrogen plasma exposure was performed just befor
e the SiNx:H deposition without vacuum breaking. A 30 s plasma treatment at
low microwave power (60 W) sharply reduces the minimum of the interface tr
ap density, from 4x10(12) to 1.6x10(12) eV(-1) cm(-2) (obtained by the high
-low frequency capacitance method). We explain this reduction due to the fo
rmation of P-N and/or In-P-N complexes at the InP surface during the plasma
-exposure step. These bonds are broken thermally after a rapid thermal anne
aling of the device. The minimum of the interface trap density, obtained at
the optimum plasma exposure conditions, is among the lowest ones reported
in the Literature and similar to those obtained with more complicated proce
ssing technologies of the SiNx:H/InP structure. This is a clear indication
that plasma exposure in N-2 atmosphere seems to be a valuable and simple su
rface conditioning method. (C) 2001 American Vacuum Society.