Substrate dependence of InGaAs quantum dots grown by molecular beam epitaxy

Citation
Wh. Jiang et al., Substrate dependence of InGaAs quantum dots grown by molecular beam epitaxy, J VAC SCI B, 19(1), 2001, pp. 197-201
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
19
Issue
1
Year of publication
2001
Pages
197 - 201
Database
ISI
SICI code
1071-1023(200101/02)19:1<197:SDOIQD>2.0.ZU;2-I
Abstract
A systematic study of self-organized In0.5Ga0.5As quantum dots (QDs) and is lands grown by molecular beam epitaxy on (100) and (n11) A/B GaAs substrate s is given, where n varies from 1 to 5. Low-temperature photoluminescence r esults show that the properties of the dots have a strong dependence on the substrate orientation as revealed by atomic force microscopy, consistent w ith the differences in size, shape, and distribution of QDs on different su bstrates. From (100) to (111) surface, the photoluminescence peak position of dots on B surfaces is found to blueshift more than that on A surfaces. Q Ds are also formed on (511) A surface. The positional distribution of these dots exhibits a wavy shape, which is related to the corrugated structure o f this surface. Two kinds of islands are formed on (111) A surface, but fur ther work is needed to explain the mechanism of these islands. (C) 2001 Ame rican Vacuum Society.