Silicon nitride as an effective protection against oxidation of a TiNi thin film in high temperature oxidizing air environment at atmospheric pressure

Authors
Roch, I Buchaillot, L Wallart, X Collard, D
Citation
I. Roch et al., Silicon nitride as an effective protection against oxidation of a TiNi thin film in high temperature oxidizing air environment at atmospheric pressure, J VAC SCI B, 19(1), 2001, pp. 305-307
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
19
Issue
1
Year of publication
2001
Pages
305 - 307
Database
ISI
SICI code
1071-1023(200101/02)19:1<305:SNAAEP>2.0.ZU;2-T