Dynamic studies of semiconductor growth processes using in situ electron microscopy

Authors
Citation
Fm. Ross, Dynamic studies of semiconductor growth processes using in situ electron microscopy, MRS BULL, 26(2), 2001, pp. 94-101
Citations number
26
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MRS BULLETIN
ISSN journal
08837694 → ACNP
Volume
26
Issue
2
Year of publication
2001
Pages
94 - 101
Database
ISI
SICI code
0883-7694(200102)26:2<94:DSOSGP>2.0.ZU;2-R
Abstract
The following is an edited transcript from the 2000 MRS Outstanding Young I nvestigator presentation given by Frances M. Ross at the 200 Materials Rese arch Society Spring Meeting in San Francisco. Ross was cited for her "innov ative and powerful experimental studies, based upon development of novel in situ electron microscopy techniques, that have provided fundamental new un derstanding of nucleation, growth, oxidation, and etching processes in a wi de range of materials systems." A Webcast of Ross' presentation in Real Med ia format can be viewed via the MRS Web site,www.mrs.org/multimedia/spring2 000/.