Mechanism of interconversion among radiation-induced defects in amorphous silicon dioxide

Citation
T. Uchino et al., Mechanism of interconversion among radiation-induced defects in amorphous silicon dioxide, PHYS REV L, 86(9), 2001, pp. 1777-1780
Citations number
31
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007 → ACNP
Volume
86
Issue
9
Year of publication
2001
Pages
1777 - 1780
Database
ISI
SICI code
0031-9007(20010226)86:9<1777:MOIARD>2.0.ZU;2-#
Abstract
We here present a series of ab initio quantum-chemical calculations on clus ters of atoms modeling several oxygen-deficiency-related defects in amorpho us silica and illustrate how these defect centers will change their atomic configurations upon photoionization. We first give theoretical evidence tha t structural conversion from a neutral oxygen monovacancy to a divalent Si defect is possible. explaining the observed photoluminescence properties as sociated with these defects.