Epitaxial growth of ZnO films on Si substrates using an epitaxial GaN buffer

Citation
A. Nahhas et al., Epitaxial growth of ZnO films on Si substrates using an epitaxial GaN buffer, APPL PHYS L, 78(11), 2001, pp. 1511-1513
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
11
Year of publication
2001
Pages
1511 - 1513
Database
ISI
SICI code
0003-6951(20010312)78:11<1511:EGOZFO>2.0.ZU;2-0
Abstract
We report on epitaxial growth of ZnO films on Si(111) substrates using an e pitaxial GaN buffer layer. A rf magnetron sputtering process has been devel oped and utilized in growing epitaxial GaN buffers on Si, and then ZnO film s on the GaN-buffered Si substrates. X-ray diffraction analysis shows that both the ZnO and GaN films are of a monocrystalline wurtzite structure with an epitaxial relationship of ZnO[0001]//GaN[0001]//Si[111] along the growt h direction and ZnO[11(2) over bar 01]//GaN[11(2) over bar0]//Si[1(1) over bar0] along the in-plane direction. The successful growth of epitaxial ZnO/ GaN films on Si demonstrates the feasibility and promise of integrating var ious functional devices on the same substrate. (C) 2001 American Institute of Physics.