High-frequency eddy-current technique for thickness measurement of micron-thick conducting layers

Authors
Sakran, F Golosovsky, M Goldberger, H Davidov, D Frenkel, A
Citation
F. Sakran et al., High-frequency eddy-current technique for thickness measurement of micron-thick conducting layers, APPL PHYS L, 78(11), 2001, pp. 1634-1636
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
11
Year of publication
2001
Pages
1634 - 1636
Database
ISI
SICI code
0003-6951(20010312)78:11<1634:HETFTM>2.0.ZU;2-3
Abstract
We demonstrate a reflection-mode eddy-current technique operating in the 10 0 MHz to 5 GHz range. It allows contactless measurement of the thickness of conducting layers (Ag, Al, Cu, W, etc.) 0.1-1 mum thick with the spatial r esolution of 1-2 mm. (C) 2001 American Institute of Physics.