Simulation of anisotropic crystalline etching using a continuous Cellular Automata algorithm

We present results on the development of an anisotropic crystalline etching simulation (ACES) program based on a new continuous Cellular Automata (CA) model, which provides improved spatial resolution and accuracy compared wi th the conventional and the stochastic CA methods. Implementation of a dyna mic CA technique provides increased simulation speed and reduced memory req uirement (5x). A first AGES software based on common personal computer plat forms has been realized. Simulated results of etching match well with exper iments. We have developed a new methodology to obtain the etch-rate diagram of anisotropic etching efficiently using both experimental and numerical t echniques.