An implanted-emitter 4H-SiC bipolar transistor with high current gain

Citation
Y. Tang et al., An implanted-emitter 4H-SiC bipolar transistor with high current gain, IEEE ELEC D, 22(3), 2001, pp. 119-120
Citations number
6
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE ELECTRON DEVICE LETTERS
ISSN journal
07413106 → ACNP
Volume
22
Issue
3
Year of publication
2001
Pages
119 - 120
Database
ISI
SICI code
0741-3106(200103)22:3<119:AI4BTW>2.0.ZU;2-G
Abstract
An epi-base, implanted-emitter, npn bipolar transistor which showed a maxim um common emitter current gain (beta) of similar to 40, the highest current gain reported for BJT in any polytype of SiC has been experimentally demon strated in 4H-SiC, The forward drop was similar to1 V at forward current de nsity of 50 A/cm(2). The current gain decreases hence specific on-resistanc e increases with increasing temperature. The negative temperature coefficie nt of beta makes the device attractive for paralleling and for preventing t hermal runaways.