Strained-layer InGaAs quantum-well heterostructure lasers

Authors
Citation
Jj. Coleman, Strained-layer InGaAs quantum-well heterostructure lasers, IEEE S T QU, 6(6), 2000, pp. 1008-1013
Citations number
46
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Eletrical & Eletronics Engineeing
Journal title
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS
ISSN journal
1077260X → ACNP
Volume
6
Issue
6
Year of publication
2000
Pages
1008 - 1013
Database
ISI
SICI code
1077-260X(200011/12)6:6<1008:SIQHL>2.0.ZU;2-H
Abstract
The incorporation of intentional strain in heterostructure lasers was almos t unheard of a decade ago or so and considered a problem to be avoided. Adv ances in both epitaxial crystal growth technology and the understanding of the physics and reliability of these materials have led to a remarkable inc rease in the commercial use of strained-layer lasers. The industry has bene fited from an increase in the available range of emission wavelengths from quantum-well diode lasers and dramatic improvement in their time-zero perfo rmance. In this paper, we review the characteristics of strained-layer InGa As quantum-well heterostructure lasers that have resulted in the emergence of this important technology.