Minority electron transport anisotropy in p-type AlxGa1-xN/GaN superlattices

Citation
L. Chernyak et al., Minority electron transport anisotropy in p-type AlxGa1-xN/GaN superlattices, IEEE DEVICE, 48(3), 2001, pp. 433-437
Citations number
24
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON ELECTRON DEVICES
ISSN journal
00189383 → ACNP
Volume
48
Issue
3
Year of publication
2001
Pages
433 - 437
Database
ISI
SICI code
0018-9383(200103)48:3<433:METAIP>2.0.ZU;2-A
Abstract
The minority electron diffusion length, L, in Mg-doped molecular beam epita xy (MBE) grown p-type AlxGa1-xN/GaN superlattices with aluminum content x = 0.1 and 0.2 was measured perpendicular and parallel to the superlattice pl anes by the electron beam induced current (EBIC) technique. A large anisotr opy in the transport properties was observed with the effect varying from 1 : 3 to 1 : 6. We attribute an experimentally observed diffusion length ani sotropy to minority electron scattering during transport across the potenti al barriers of the superlattice. Reference p-GaN samples were also investig ated, and the diffusion length was observed to be isotropic in both metal o rganic chemical vapor deposition (MOCVD) (L = 0.5 mum) and MBE (L = 0.27 mu m) grown samples.