Gallium nitride based high power heterojunction field effect transistors: Process development and present status at UCSB

Citation
S. Keller et al., Gallium nitride based high power heterojunction field effect transistors: Process development and present status at UCSB, IEEE DEVICE, 48(3), 2001, pp. 552-559
Citations number
45
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON ELECTRON DEVICES
ISSN journal
00189383 → ACNP
Volume
48
Issue
3
Year of publication
2001
Pages
552 - 559
Database
ISI
SICI code
0018-9383(200103)48:3<552:GNBHPH>2.0.ZU;2-Y
Abstract
The development of GaN based devices for microwave power electronics at the University of California, Santa Barbara (UCSB), is reviewed, From 1995 to 2000, the power performance of AlGaN/GaN on-sapphire heterojunction field e ffect transistors improved from 1.1 W/mm to 6.6 W/mm, respectively. Compens ating the disadvantages of the low thermal conductivity of the sapphire sub strate through heat management via flip chip bonding onto AIN substrates, l arge periphery devices with an output power of 7.6 W were demonstrated. UCS B also fabricated the first GaN based amplifier integrated circuits, Critic al issues involved in the growth of high quality AlGaN/GaN heterostructures by metal-organic chemical vapor deposition and the device fabrication are discussed.