A system model for feedback control and analysis of yield: A multistep process model of effective gate length, poly line width, and IV parameters

We present a large system model capable of producing Pareto charts for seve ral yield metrics, including effective channel length, poly line width, I-o n and I-sub. These Pareto charts enable us to target specific processes for improvement of the yield metric(s), Our neural network model has an accura cy of 80% and can be trained with a small data set to minimize the feedback time in the control loop for the yield. The system we describe has been im plemented in a Lucent Technologies microelectronics lab in Orlando, FL.