Precursor design for liquid injection CVD of lead scandium tantalate thin films

Liquid Injection Chemical Vapour Deposition is a technique well suited to t he deposition of a range of ferroelectric oxides in thin film form. This pa per reports on the design and optimisation of the precursors for the deposi tion of thin films of the promising pyroelectric material, lead scandium ta ntalate. The design and use of lead, scandium and tantalum precursors with carefully matched chemical and thermal properties allows the growth of thin films with the required perovskite phase above 550 degreesC. These have th e desired 111 orientation when grown on to platinum coated silicon substrat es at temperatures above 575 degreesC.