Metalorganic chemical vapor deposition of BaTiO3 and SrTiO3 thin films using a single solution source with a non-contact vaporizer

Authors
Ma, WH Schafer, P Ehrhart, P Waser, P
Citation
Wh. Ma et al., Metalorganic chemical vapor deposition of BaTiO3 and SrTiO3 thin films using a single solution source with a non-contact vaporizer, INTEGR FERR, 30(1-4), 2000, pp. 139-148
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Eletrical & Eletronics Engineeing
Journal title
INTEGRATED FERROELECTRICS
ISSN journal
10584587 → ACNP
Volume
30
Issue
1-4
Year of publication
2000
Pages
139 - 148
Database
ISI
SICI code
1058-4587(2000)30:1-4<139:MCVDOB>2.0.ZU;2-T
Abstract
BaTiO3 and SrTiO3 thin films were prepared by reduced-pressure metalorganic chemical vapor deposition. Ba(thd)(2)-di-tri, or Sr(thd)(2), and Ti(OPri)( 2)-(thd)(2) were dissolved in diglyme and were delivered by an aerosol-assi sted non-contact vaporizer. Growth kinetics of the thin films was studied a s: a function of growth temperature, liquid source concentration and molar ratio of the metalorganic precursors. The mechanisms of composition control , crystallization and phase formation of the thin films were investigated o ver a wide range of stoichiometry.