Advanced model of metal-organic chemical vapor deposition of BaxSr1-xTiO3 oxides

Authors
Mymrin, VF Smirnov, SA Komissarov, AE Karpov, SY Przhevalski, IN Makarov, YN Dauelsberg, M Schumacher, M Strzyzewski, P Strauch, G Juergensen, H
Citation
Vf. Mymrin et al., Advanced model of metal-organic chemical vapor deposition of BaxSr1-xTiO3 oxides, INTEGR FERR, 30(1-4), 2000, pp. 271-280
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Eletrical & Eletronics Engineeing
Journal title
INTEGRATED FERROELECTRICS
ISSN journal
10584587 → ACNP
Volume
30
Issue
1-4
Year of publication
2000
Pages
271 - 280
Database
ISI
SICI code
1058-4587(2000)30:1-4<271:AMOMCV>2.0.ZU;2-C
Abstract
An advanced model of BaxSr1-xTiO3 Chemical Vapor Deposition is proposed. Th e model implies that metal-organic precursor decomposition occurs primarily at the reactor surfaces. Deposition of various parasitic solid phases (TiO 2, BaO, SrO, etc.) is taken into account, The model predicts deposition rat s, solid phase composition and fraction of parasitic phases in the grown fi lm as a function of growth parameters.