Quantum well and laser containing InAs quantum dots

Citation
Ca. Chang et al., Quantum well and laser containing InAs quantum dots, J CRYST GR, 223(1-2), 2001, pp. 92-98
Citations number
12
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
223
Issue
1-2
Year of publication
2001
Pages
92 - 98
Database
ISI
SICI code
0022-0248(200102)223:1-2<92:QWALCI>2.0.ZU;2-1
Abstract
Multiple quantum wells (MQW) and laser-containing InAs quantum dots were gr own on GaAs using molecular-beam epitaxy. For the MQW, the wells consisted of monolayers of InAs covered by In0.15Ga0.5As, with the barrier layers bei ng GaAs. The photoluminescence measurements were correlated with the strain in the wells. A continuing strain was observed for the wells containing th in InAs layer, where the photoluminescence wavelength was close to that of In,In0.15Ga0.85As. For the wells with a thicker InAs layer, with a photolum inescence wavelength of 1.28 mum, a discontinuing strain was observed. Dopi ng of the well constituents with Si, individually or collectively, led to a reduced photoluminescence intensity, but an enhanced intensity was observe d with the Be doping. Doping the InGaAs layer alone showed the least reduct ion in intensity using Si and most enhancement using Be. Continuous-wave la sing at room temperature was observed for the laser containing similar quan tum wells. (C) 2001 Published by Elsevier Science B.V.