Wj. Chun et al., Development of an in situ polarization-dependent total-reflection fluorescence XAFS measurement system, J SYNCHROTR, 8, 2001, pp. 168-172
An in situ polarization-dependent total-reflection fluorescence X-ray absor
ption fine structure (PTRF-XAFS) spectroscopy system has been developed, wh
ich enables PTRF-XAFS experiments to be performed in three different orient
ations at various temperatures (273-600 K) and pressures (10(-10) similar t
o 760 torr). The system consists of a measurement chamber and a preparation
chamber. The measurement chamber has a high-precision six-axis goniometer
and a multi-element solid-state detector. Using a transfer chamber, also op
erated under ultra-high-vacuum conditions, the sample can be transferred to
the measurement chamber from the preparation chamber, which possesses low-
energy electron diffraction, Auger electron spectroscopy and X-ray photoele
ctron spectroscopy facilities, as well as a sputtering gun and an annealing
system. The in situ PTRF-EXAFS for Cu species on TiO2 (110) has been measu
red in three different orientations, revealing anisotropic growth of Cu und
er the influence of the TiO2 (110) surface.