Development of an in situ polarization-dependent total-reflection fluorescence XAFS measurement system

Citation
Wj. Chun et al., Development of an in situ polarization-dependent total-reflection fluorescence XAFS measurement system, J SYNCHROTR, 8, 2001, pp. 168-172
Citations number
24
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF SYNCHROTRON RADIATION
ISSN journal
09090495 → ACNP
Volume
8
Year of publication
2001
Part
2
Pages
168 - 172
Database
ISI
SICI code
0909-0495(200103)8:<168:DOAISP>2.0.ZU;2-Q
Abstract
An in situ polarization-dependent total-reflection fluorescence X-ray absor ption fine structure (PTRF-XAFS) spectroscopy system has been developed, wh ich enables PTRF-XAFS experiments to be performed in three different orient ations at various temperatures (273-600 K) and pressures (10(-10) similar t o 760 torr). The system consists of a measurement chamber and a preparation chamber. The measurement chamber has a high-precision six-axis goniometer and a multi-element solid-state detector. Using a transfer chamber, also op erated under ultra-high-vacuum conditions, the sample can be transferred to the measurement chamber from the preparation chamber, which possesses low- energy electron diffraction, Auger electron spectroscopy and X-ray photoele ctron spectroscopy facilities, as well as a sputtering gun and an annealing system. The in situ PTRF-EXAFS for Cu species on TiO2 (110) has been measu red in three different orientations, revealing anisotropic growth of Cu und er the influence of the TiO2 (110) surface.