Development of multipurpose laboratory XIEES spectrometer and its application to surface XAFS analysis of Al2O3 films.

A new laboratory spectrometer for X-ray Induced Electron Emission Spectrosc opy (XIEES) has been developed. This spectrometer is suitable for measureme nts of X-ray Absorption Fine Structure (XAFS) spectrum in surface sensitive fluorescence and electron emission detection modes as well as in standard transmission mode. It is the advantage of this spectrometer that a wide ran ge of x-ray energy scanning between 0.48 and 41 keV is available. At the Cu K-edge, a energy resolution of about 2 eV has been achieved. The spectrome ter has been used to analyze the Al2O3 (40 Angstrom and 500 Angstrom)/Si(10 0) with total electron yield measurement.