In situ XAS characterization of the electrochemical insertion of copper inpolypyrrole films.

Authors
Alves, MCM Watanbe, N Ramos, AY Tolentino, HCN
Citation
Mcm. Alves et al., In situ XAS characterization of the electrochemical insertion of copper inpolypyrrole films., J SYNCHROTR, 8, 2001, pp. 517-519
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF SYNCHROTRON RADIATION
ISSN journal
09090495 → ACNP
Volume
8
Year of publication
2001
Part
2
Pages
517 - 519
Database
ISI
SICI code
0909-0495(200103)8:<517:ISXCOT>2.0.ZU;2-8
Abstract
We report the electrochemical insertion of copper in polypyrrole films foll owed by XAS spectroscopy. Depending on the applied potential the copper rem ains as an ionic form like Cu+n-(OSO3-)(n). For more reductive potentials m etal particles are synthesized. Small particles with an estimated average d iameter of 20 Angstrom were obtained.