We have performed Diffraction Anomalous Fine Structure measurements at the
As K-edge of self-growth InAs/InP(001) Quantum Wires and InAs/GaAs(001) Qua
ntum Dots. The samples have been grown by Molecular Beam Epitaxy and their
equivalent thickness is of 2.5 monolayers. We have measured the (440) and (
420) Bragg reflections in glancing-angle scattering geometry, at incidence
angles close to the substrate critical angle. We demonstrate the feasibilit
y of the experiment reporting, for the first time, Diffraction Anomalous Fi
ne Structure spectra of such low coverage epitaxial layers, and we show tha
t the analysis of the Diffraction Anomalous Fine Structure lineshape togeth
er with the analysis of oscillatory part of the signal, can provide informa
tion about composition and strain of the nanostructures.